⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21961910 | 0.80 | — | — | |
| SCHEMBL11880572 | 0.80 | KDM4E (0.34) | — | |
| SCHEMBL21961913 | 0.77 | — | — | |
| SCHEMBL4260971 | 0.76 | — | — | |
| SCHEMBL18981047 | 0.75 | EGFR (0.39) | — | |
| SCHEMBL21961906 | 0.75 | SIRT2 (0.42) | — | |
| SCHEMBL21961902 | 0.73 | SIRT2 (0.45) | — | |
| SCHEMBL17696764 | 0.73 | SIRT2 (0.45) | — | |
| SCHEMBL20246088 | 0.73 | MEN1 (0.34) | — | |
| SCHEMBL5670125 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220056207-A1 | METHOD FOR PRODUCING A POLYESTER-POLYETHER POLYOL BLOCK COPOLYMER | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2022-02-24 | — | — | US | claimed |
| EP-3728397-A1 | METHOD FOR PRODUCING POLYETHERESTER POLYOLS | Covestro Deutschland AG (DE) | 2020-10-28 | — | — | EP | claimed |
| US-20200317860-A1 | METHOD FOR PRODUCING POLYETHERESTER POLYOLS | COVESTRO DEUTSCHLAND AG (DE) | 2020-10-08 | — | — | US | claimed |
| EP-3670571-A1 | METHOD FOR PRODUCING A POLYESTER-POLYETHERPOLYOL BLOCK COPOLYMER | Covestro Deutschland AG (DE) | 2020-06-24 | — | — | EP | claimed |
| JP-61026681-A | — | — | None | — | — | JP | disclosed |
| WO-2025095981-A1 | MOLDED ARTICLES OF MODIFIED POLYGLYCOLIC ACID FOR DEGRADABLE DOWNHOLE TOOLS APPLICATION | CNPC USA Corp. (US) | 2025-05-08 | — | — | WO | disclosed |
| CN-113950501-B | Process for the continuous preparation of polyoxyalkylene polyols | 科思创德国股份有限公司 | 2024-06-25 | — | — | CN | disclosed |
| EP-3429567-B1 | METHODS AND COMPOSITIONS FOR TREATING OBESITY AND/OR DIABETES AND FOR IDENTIFYING CANDIDATE TREATMENT AGENTS | THE J DAVID GLADSTONE INST (US) | 2024-01-10 | — | — | EP | disclosed |
| EP-3717537-B1 | REACTION SYSTEM FOR A 1K-POLYURETHANE FOAM | COVESTRO DEUTSCHLAND AG (DE) | 2023-04-19 | — | — | EP | disclosed |
| US-20230086177-A1 | PROCESS FOR PREPARING POLYETHER CARBONATE POLYOLS | COVESTRO DEUTSCHLAND AG (DE) | 2023-03-23 | — | — | US | disclosed |
| EP-3980480-B1 | METHOD FOR CONTINUOUS PRODUCTION OF POLYOXYALKYLENPOLYOLS | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2023-03-22 | — | — | EP | disclosed |
| CN-115190893-A | Method for producing polyether carbonate polyols | 科思创德国股份有限公司 | 2022-10-14 | — | — | CN | disclosed |
| US-5017663-A | Polyphenylene ether, polyamide blend | SUMITOMO CHEMICAL CO., LTD. (JP) | 1991-05-21 | — | — | US | disclosed |
| EP-0408255-A1 | Thermoplastic resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-01-16 | — | — | EP | disclosed |
| EP-0394016-A2 | Resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-10-24 | — | — | EP | disclosed |
| EP-0391733-A2 | Thermoplastic resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-10-10 | — | — | EP | disclosed |
| EP-0382548-A2 | Thermoplastic resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-08-16 | — | — | EP | disclosed |
| EP-0381391-A2 | Resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-08-08 | — | — | EP | disclosed |
| EP-0368283-A2 | Resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-05-16 | — | — | EP | disclosed |
| JP-S6126681-A | VEHICLE FOR PRINTING INK HAVING EXCELLENT ADHESIVITY | KURARAY CO LTD | 1986-02-05 | — | — | JP | disclosed |