⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL136540 | 1.00 | — | — | |
| SCHEMBL16500171 | 0.97 | — | — | |
| SCHEMBL6863481 | 0.94 | — | — | |
| SCHEMBL2992159 | 0.79 | — | — | |
| SCHEMBL8964788 | 0.78 | — | — | |
| SCHEMBL20646531 | 0.74 | — | — | |
| SCHEMBL30986811 | 0.74 | — | — | |
| SCHEMBL18389135 | 0.72 | — | — | |
| SCHEMBL20646532 | 0.72 | — | — | |
| SCHEMBL3001726 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8470513-B2 | Radiation-sensitive resin composition and polymer | JSR CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120058429-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-7267923-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-11 | — | — | US | disclosed |
| US-20070148584-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-28 | — | — | US | disclosed |