⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL136542 | 0.94 | — | — | |
| SCHEMBL136540 | 0.94 | — | — | |
| SCHEMBL16500171 | 0.92 | — | — | |
| SCHEMBL30986811 | 0.81 | — | — | |
| SCHEMBL2992159 | 0.74 | — | — | |
| SCHEMBL8964788 | 0.71 | — | — | |
| SCHEMBL22000997 | 0.69 | — | — | |
| SCHEMBL19453352 | 0.69 | SLC6A4 (0.34) | — | |
| SCHEMBL20646531 | 0.69 | — | — | |
| SCHEMBL14300594 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6800720-B2 | BASE POLYMER CONTAINING AN ESTER GROUP TO BE DECOMPOSED TO A CARBOXYLIC ACID TO BECOME SOLUBLE IN THE DEVELOPER FOR A PHOTORESIST USED IN FINE WORKING OF A SEMICONDUCTOR USING ULTRAVIOLET RAY; HEAT RESISTANCE; OPTICS; ADHESION | MITSUI CHEMICALS, INC. (JP) | 2004-10-05 | — | — | US | disclosed |