SCHEMBL13656363

SCHEMBL13656363

C=CCC(O)(CC=C)C1COC(C)(C)O1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16155393 0.85 PTPN1 (0.36) PTPN1
SCHEMBL20193684 0.85 PTPN1 (0.36) PTPN1
SCHEMBL16155394 0.77 CA2 (0.30)
SCHEMBL20193683 0.77 CA2 (0.30)
SCHEMBL4665623 0.75 PTPN1 (0.33) PTPN1
SCHEMBL16155407 0.75 PTPN1 (0.33) PTPN1
SCHEMBL2035953 0.73 CA2 (0.32)
SCHEMBL9194766 0.72 CYP3A4 (0.37)
SCHEMBL5349777 0.71 CA2 (0.34)
SCHEMBL1487031 0.71 CA2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7604918-B2 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-10-20 US disclosed
US-7604918-B2 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-10-20 US disclosed
US-20070172760-A1 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO. LTD 2007-07-26 US disclosed
US-20070172760-A1 Photosensitive polymer and photoresist composition having the same SAMSUNG ELECTRONICS CO. LTD 2007-07-26 US disclosed