Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.59 |
| ▸ | MEN1 | O00255 | 2/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.59 |
| ▸ | KCNA5 | P22460 | 6/20 | 0.47 |
| ▸ | KCNN4 | O15554 | 3/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8862371 | 0.93 | NPSR1 (0.51) | NPSR1MEN1KMT2AKCNA5KCNN4 | |
| SCHEMBL11138881 | 0.85 | NPSR1 (0.59) | NPSR1MEN1KMT2AKCNA5TDP1 | |
| SCHEMBL14288550 | 0.84 | MEN1 (0.47) | NPSR1MEN1KMT2AKCNA5 | |
| SCHEMBL14304254 | 0.80 | KCNA5 (0.49) | NPSR1MEN1KMT2AKCNA5KCNN4 | |
| SCHEMBL14304788 | 0.79 | MMP1 (0.48) | NPSR1MEN1KMT2AKCNA5MAPT | |
| SCHEMBL14493542 | 0.78 | NPSR1 (0.51) | NPSR1MEN1KMT2AMAPT | |
| SCHEMBL11142922 | 0.78 | MEN1 (0.51) | NPSR1MEN1KMT2A | |
| SCHEMBL14303128 | 0.77 | MMP1 (0.49) | NPSR1MEN1KMT2AKCNA5MAPT | |
| SCHEMBL14303126 | 0.77 | MMP1 (0.49) | NPSR1MEN1KMT2AKCNA5MAPT | |
| SCHEMBL29089044 | 0.76 | NPSR1 (0.47) | NPSR1MEN1KMT2AKCNA5KCNN4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190235376-A1 | THERMALLY-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND PREPARATION METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2019-08-01 | — | — | US | disclosed |
| US-7608391-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2009-10-27 | — | — | US | disclosed |
| US-7608391-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2009-10-27 | — | — | US | disclosed |
| US-7497107-B2 | Gas sensing material and gas inspecting method | FUJI PHOTO FILM CO., LTD. (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7497107-B2 | Gas sensing material and gas inspecting method | FUJI PHOTO FILM CO., LTD. (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20090023103-A1 | SOLID DISPERSION, PROCESS OF PRODUCING SOLID DISPERSION, AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
| US-20090023103-A1 | SOLID DISPERSION, PROCESS OF PRODUCING SOLID DISPERSION, AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
| US-7465533-B2 | Photothermographic material and an image forming method | FUJIFILM CORPORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7465533-B2 | Photothermographic material and an image forming method | FUJIFILM CORPORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7462444-B2 | Image forming method for the photothermographic material | FUJIFILM CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-7157217-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157217-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157220-B2 | Silver halide photosensitive material and photothermographic material | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157220-B2 | Silver halide photosensitive material and photothermographic material | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157218-B2 | Suppressed fogging and printout and is excellent in storage stability of an image against stain | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157218-B2 | Suppressed fogging and printout and is excellent in storage stability of an image against stain | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7158164-B2 | Thermal development method and apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157665-B2 | Heat development apparatus and method | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157665-B2 | Heat development apparatus and method | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7158164-B2 | Thermal development method and apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |