SCHEMBL13657207

SCHEMBL13657207

CCC(CC)N1CCCCCC1=O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.53
CA12 O43570 1/20 0.53
CA1 P00915 1/20 0.53
CA2 P00918 1/20 0.53
CA3 P07451 1/20 0.53
CA4 P22748 1/20 0.53
CA6 P23280 1/20 0.53
CA5A P35218 1/20 0.53
CA7 P43166 1/20 0.53
CA9 Q16790 1/20 0.53
CA13 Q8N1Q1 1/20 0.53
CA14 Q9ULX7 1/20 0.53
CA5B Q9Y2D0 1/20 0.53
CHRM2 P08172 3/20 0.44
CHRM4 P08173 3/20 0.44
CHRM5 P08912 3/20 0.44
CHRM1 P11229 3/20 0.44
CHRM3 P20309 3/20 0.44
PIK3CD O00329 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14834787 0.98 LMNA (0.55) LMNACA12CA1CA2CA3
SCHEMBL12156956 0.91 LMNA (0.61) LMNACA12CA1CA2CA3
SCHEMBL24333260 0.89 LMNA (0.47) LMNACA12CA1CA2CA3
SCHEMBL13784613 0.87 LMNA (0.46) LMNACA12CA1CA2CA3
SCHEMBL10065560 0.86 LMNA (0.45) LMNACA12CA1CA2CA3
SCHEMBL12015117 0.84 LMNA (0.47) LMNACA12CA1CA2CA3
SCHEMBL17917403 0.84 LMNA (0.47) LMNACA12CA1CA2CA3
SCHEMBL10031604 0.84 LMNA (0.50) LMNACA12CA1CA2CA3
SCHEMBL18923715 0.84 LMNA (0.46) LMNACA12CA1CA2CA3
SCHEMBL13259746 0.84 LMNA (0.50) LMNACA12CA1CA2CA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10400052-B2 Polymers having N-vinyl amide and hydroxyl moieties, their compositions and the uses thereof ISP INVESTMENTS LLC (US) 2019-09-03 US disclosed
US-7604911-B2 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-10-20 US disclosed
US-20080076255-A1 MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMING THE SAME, METHOD FOR PREPARING COATING, COMPOSITION FOR FINE PATTERN FORMATION, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE HATA MITSUHIRO 2008-03-27 US disclosed
US-7314691-B2 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-01 US disclosed