Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19348914 | 0.90 | ALDH1A1 (0.54) | TSHRALDH1A1LMNATRPA1TDP1 | |
| SCHEMBL2380019 | 0.86 | ALDH1A1 (0.68) | TSHRALDH1A1LMNATRPA1TDP1 | |
| SCHEMBL7766928 | 0.85 | ALDH1A1 (0.62) | TSHRALDH1A1LMNATRPA1TDP1 | |
| SCHEMBL901417 | 0.85 | TSHR (0.56) | TSHRALDH1A1LMNATRPA1TDP1 | |
| SCHEMBL12047581 | 0.83 | ALDH1A1 (0.48) | TSHRALDH1A1LMNATDP1 | |
| SCHEMBL12521274 | 0.83 | TSHR (0.48) | TSHRALDH1A1 | |
| SCHEMBL27970551 | 0.83 | ALDH1A1 (0.60) | TSHRALDH1A1LMNATRPA1TDP1 | |
| SCHEMBL20608613 | 0.81 | ALDH1A1 (0.64) | TSHRALDH1A1LMNATDP1 | |
| SCHEMBL15354042 | 0.81 | ALDH1A1 (0.56) | TSHRALDH1A1LMNATRPA1TDP1 | |
| SCHEMBL7705881 | 0.81 | ALDH1A1 (0.56) | TSHRALDH1A1LMNATRPA1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-115044040-A | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2022-09-13 | — | — | CN | disclosed |
| EP-2042339-B1 | Fountain solution composition for lithographic printing and heatset offset rotary printing process | FUJIFILM CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| US-20090226616-A1 | FOUNTAIN SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING AND HEAT-SET OFFSET ROTARY PRINTING PROCESS | FUJIFILM CORPORATION (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20090226616-A1 | FOUNTAIN SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING AND HEAT-SET OFFSET ROTARY PRINTING PROCESS | FUJIFILM CORPORATION (JP) | 2009-09-10 | — | — | US | disclosed |
| EP-2098377-A2 | Fountain solution composition for lithographic printing and heat-set offset rotary printing process | FUJIFILM Corporation (JP) | 2009-09-09 | — | — | EP | disclosed |
| EP-2042339-A2 | Fountain solution composition for lithographic printing and heatset offset rotary printing process | Fujifilm Corporation (JP) | 2009-04-01 | — | — | EP | disclosed |
| US-20090078140-A1 | FOUNTAIN SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING AND HEAT-SET OFFSET ROTARY PRINTING PROCESS | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090078140-A1 | FOUNTAIN SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING AND HEAT-SET OFFSET ROTARY PRINTING PROCESS | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |