Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 4/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 3/20 | 0.33 |
| ▸ | ATF4 | P18848 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.30 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1899578 | 0.86 | EPHX1 (0.34) | EPHX1NPC1ALOX5CYP2C19CA1 | |
| SCHEMBL12599011 | 0.81 | HTT (0.39) | EPHX1NPC1ALOX5CYP2C19CA1 | |
| SCHEMBL22154807 | 0.81 | HTT (0.39) | EPHX1NPC1ALOX5CYP2C19CA1 | |
| SCHEMBL6120762 | 0.79 | HTT (0.40) | EPHX1NPC1ALOX5CYP2C19CA1 | |
| SCHEMBL6657985 | 0.76 | EPHX1 (0.35) | EPHX1NPC1CYP2C19NAAAATF4 | |
| Bicarbonate SCHEMBL13570853 | 0.74 | EPHX1 (0.39) | EPHX1NPC1CYP2C19NAAAATF4 | |
| SCHEMBL12599205 | 0.74 | — | — | |
| SCHEMBL24564741 | 0.74 | THRA (0.42) | EPHX1NPC1CYP2C19NAAA | |
| SCHEMBL1734827 | 0.74 | THRA (0.42) | EPHX1NPC1CYP2C19NAAA | |
| SCHEMBL15159536 | 0.74 | THRA (0.42) | EPHX1NPC1CYP2C19NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2521941-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM Corporation (JP) | 2012-11-14 | — | — | EP | disclosed |