SCHEMBL13715548

SCHEMBL13715548

O=C(Nc1nnn[nH]1)NC(CO)CO

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ROCK2 O75116 3/20 0.35
ROCK1 Q13464 3/20 0.35
MAPK1 P28482 1/20 0.32
MMP3 P08254 1/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12057465 0.80 MDM2 (0.33)
SCHEMBL13875258 0.79 GAA (0.31)
SCHEMBL13446564 0.79 FPR2 (0.31)
SCHEMBL13715644 0.76 CNR2 (0.31)
SCHEMBL13446566 0.76 FPR2 (0.33)
SCHEMBL13411727 0.75 SMN1; SMN2 (0.33) MMP3
SCHEMBL13715586 0.75 ABL1 (0.39) MAPK1
SCHEMBL13876942 0.74
SCHEMBL13411728 0.74 NAALAD2 (0.37) MMP3
SCHEMBL13411731 0.73 BACE1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 US disclosed