SCHEMBL1373352

SCHEMBL1373352

C=CC(=O)OC(O)C(C)O

nearest known ligand 0.45

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.45
HPGD P15428 1/20 0.39
ALDH1A1 P00352 5/20 0.34
TP53 P04637 3/20 0.34
HIF1A Q16665 3/20 0.34
CYP3A4 P08684 2/20 0.34
MAPK1 P28482 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HSD17B10 Q99714 1/20 0.33
HCAR2 Q8TDS4 1/20 0.32
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27617064 0.88 TSHR (0.43) TSHRHPGDALDH1A1TP53HIF1A
Methacrylic Acid SCHEMBL28021643 0.88 TSHR (0.37) TSHRHPGDALDH1A1HCAR2
SCHEMBL1092841 0.86 TSHR (0.45) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL30938817 0.85 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL8965801 0.84 TSHR (0.43) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28005115 0.84 TSHR (0.43) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9719541 0.83 TSHR (0.39) TSHRHPGD
SCHEMBL8965588 0.82 TSHR (0.39) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL8965566 0.82 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL11308785 0.82 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0231680-B1 USE OF AN ORGANIC BINDER-BASED COMPOSITION IN OR ON A HUMID ENIVRONMENT, AND PROCESS FOR THE PREPARATION OF THE MORTAR NORSOLOR S.A. (FR) 1989-12-13 EP claimed
US-3950257-A ACRYLONITRILE-VINYL COPOLYMERS, SOLVENTS DAICEL LTD. (JA) 1976-04-13 US claimed
EP-3284771-B1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT TORAY INDUSTRIES (JP) 2023-08-30 EP disclosed
CN-109188793-B Flexible three-dimensional electrode, preparation method thereof and liquid crystal display panel TCL华星光电技术有限公司 2021-05-28 CN disclosed
CN-112662303-A Highly water-resistant resin composition for optical fiber coating 露温迪克埃蒂姆有限公司 2021-04-16 CN disclosed
CN-107407869-B Photosensitive resin composition, method for producing resin cured film, and semiconductor device 东丽株式会社 2020-09-22 CN disclosed
CN-106547168-B Black matrix material composition and application 深圳市华星光电技术有限公司 2020-09-01 CN disclosed
EP-2937732-B1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM AND DISPLAY DEVICE TORAY INDUSTRIES (JP) 2020-08-19 EP disclosed
CN-110112212-A Thin film transistor (TFT) and array substrate 深圳市华星光电技术有限公司 2019-08-09 CN disclosed
US-10365559-B2 Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device TORAY INDUSTRIES, INC. (JP) 2019-07-30 US disclosed
CN-109188793-A A kind of preparation method of flexible stereo electrode and preparation method thereof, liquid crystal display panel 深圳市华星光电技术有限公司 2019-01-11 CN disclosed
EP-0830209-B1 METHOD OF DEPRESSING NON-SULFIDE SILICATE GANGUE MINERALS CYTEC TECH CORP (US) 1999-08-11 EP disclosed
US-5533626-A FROTH FLOTATION USING POLYMER MIXTURE OF POLYSACCHARIDES ANDACRYLAMIDE POLYMER CYTEC TECHNOLOGY CORP. (US) 1996-07-09 US disclosed
US-5531330-A Method of depressing non-sulfide silicate gangue minerals CYTEC TECHNOLOGY CORP. (US) 1996-07-02 US disclosed
US-5525212-A USING MIXTURE OF A POLYSACCHARIDE AND A GRAFT POLYMER OF VINYL ALCOHOL AND ACRYLAMIDE CYTEC TECHNOLOGY CORP. (US) 1996-06-11 US disclosed
US-5507395-A IMPROVING FROTH FLOTATION WITH A DEPRESSANT COMPRISING A GRAFT POLYMER OF VINYL ALCOHOL AND AN ACRYLAMIDES CYTEC TECHNOLOGY CORP. (US) 1996-04-16 US disclosed
EP-0651032-A1 Filler surface modifier Ajinomoto Co., Inc. (JP) 1995-05-03 EP disclosed
US-4650743-A PHOTOPOLYMERIZED HYDROZYALKYL ACRYLATE AND OLIGOMER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1987-03-17 US disclosed
EP-0210638-A2 Optical coating composition E.I. DU PONT DE NEMOURS AND COMPANY (US) 1987-02-04 EP disclosed
US-3950257-A ACRYLONITRILE-VINYL COPOLYMERS, SOLVENTS DAICEL LTD. (JA) 1976-04-13 US disclosed