Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FSHR | P23945 | 1/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | BACE1 | P56817 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29409547 | 1.00 | FSHR (0.42) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL27926236 | 0.98 | FSHR (0.41) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL27224482 | 0.97 | FSHR (0.40) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL29374824 | 0.93 | FSHR (0.42) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL140434 | 0.93 | FSHR (0.42) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL15945518 | 0.92 | FSHR (0.39) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL27908100 | 0.91 | FSHR (0.41) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL27862690 | 0.90 | FSHR (0.44) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL24178022 | 0.89 | FSHR (0.43) | FSHRCYP19A1ALDH1A1MEN1KMT2A | |
| SCHEMBL24684599 | 0.88 | ALDH1A1 (0.41) | FSHRCYP19A1ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1579 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4257623-B1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2026-05-27 | — | — | EP | claimed |
| US-12404362-B2 | Curable resin system | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC | 2025-09-02 | — | — | US | claimed |
| US-20240085789-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-14 | — | — | US | claimed |
| EP-3441428-B1 | POLYIMIDE RESIN COMPOSITION, METHOD FOR PRODUCING SAME, AND POLYIMIDE FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2024-03-13 | — | — | EP | claimed |
| US-11899364-B2 | Photosensitive polyimide compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-02-13 | — | — | US | claimed |
| US-20230407089-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-21 | — | — | US | claimed |
| US-11786870-B2 | CMS membrane, method for the production thereof and use thereof | Forschungszentrum Jülich GmbH (DE) | 2023-10-17 | — | — | US | claimed |
| EP-4257622-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-11 | — | — | EP | claimed |
| EP-4257623-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-11 | — | — | EP | claimed |
| US-11782344-B2 | Photosensitive polyimide compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2023-10-10 | — | — | US | claimed |
| US-4908134-A | Contacting heated stream with polyimide membrane to selectively permeate through the membrane the oil or wax component while producing retentate containing dewaxing aid which is recycled | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1990-03-13 | — | — | US | claimed |
| US-4828964-A | UNDERLAY FOR LIFT-OFF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1989-05-09 | — | — | US | claimed |
| EP-0143075-B1 | PROCESS FOR THE PREPARATION OF N-GLYCIDYL COMPOUNDS | CIBA-GEIGY AG (CH) | 1987-11-19 | — | — | EP | claimed |
| US-4663401-A | POLYSULFONE POLYETHER BLEND WITH DIAMINE CURING AGENT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-05-05 | — | — | US | claimed |
| EP-0212334-A2 | Improved polyimide formulation for forming a patterned film on a substrate | International Business Machines Corporation (US) | 1987-03-04 | — | — | EP | claimed |
| EP-0161576-A2 | Epoxy resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1985-11-21 | — | — | EP | claimed |
| US-4540769-A | NITRATE, PERCHLORATE, ALPHA-HALO CARBOXYLATE OR SULFONATE | CIBA-GEIGY CORPORATION (US) | 1985-09-10 | — | — | US | claimed |
| EP-0143075-A1 | Process for the preparation of N-glycidyl compounds | CIBA-GEIGY AG (CH) | 1985-05-29 | — | — | EP | claimed |
| US-4454347-A | Process for purification and isolation of diaminophenylindane | CIBA-GEIGY CORPORATION (US) | 1984-06-12 | — | — | US | claimed |
| US-3983092-A | CURING AGENTS | CIBA-GEIGY CORPORATION (US) | 1976-09-28 | — | — | US | claimed |