SCHEMBL13744342

SCHEMBL13744342

FC(F)(F)C(F)(F)C(F)(F)C(F)(F)CC1OCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13744573 0.93
SCHEMBL13744044 0.83
SCHEMBL13744575 0.77 KDM4E (0.31)
SCHEMBL20617788 0.74 ALDH1A1 (0.31)
SCHEMBL13970924 0.74 ALDH1A1 (0.31)
SCHEMBL711102 0.74 ALDH1A1 (0.31)
SCHEMBL7940540 0.73 GBA1 (0.31)
SCHEMBL13354394 0.73 GBA1 (0.31)
SCHEMBL191770 0.73 GBA1 (0.31)
SCHEMBL5945112 0.73 GBA1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111032669-B Orthoester compositions for affinity purification of oligonucleotides 安捷伦科技有限公司 2024-03-29 CN disclosed
CN-111032669-A Ortho ester compositions for affinity purification of oligonucleotides 安捷伦科技有限公司 2020-04-17 CN disclosed
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed