SCHEMBL13744580

SCHEMBL13744580

C=C(C(=O)OC1CCC(C(F)(F)C(F)(F)C(F)(F)C(F)F)CC1)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
TSHR P16473 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15840347 0.86
SCHEMBL6106447 0.84 GPR35 (0.30)
SCHEMBL6103703 0.83
SCHEMBL25172279 0.76 MAPT (0.43) KDM4E
SCHEMBL13716018 0.75 GPR35 (0.31)
SCHEMBL6316283 0.74 GPR35 (0.34)
SCHEMBL6104825 0.73 GPR35 (0.40)
SCHEMBL14887127 0.73 APOBEC3A (0.31) KDM4E
SCHEMBL13888379 0.72 GPR35 (0.33)
SCHEMBL13744636 0.72 APOBEC3A (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed