SCHEMBL13744673

SCHEMBL13744673

C=C(C(=O)OCC(F)F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.36
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1959455 0.82 TSHR (0.59) TSHR
SCHEMBL18560051 0.82 TSHR (0.35) TSHR
SCHEMBL5946579 0.80 TSHR (0.42) TSHRHTT
SCHEMBL13806613 0.79 TSHR (0.37) TSHRHTT
SCHEMBL28613332 0.77 TSHR (0.37) TSHR
SCHEMBL5667653 0.76 TSHR (0.36) TSHRHTT
SCHEMBL4338291 0.76 TSHR (0.43) TSHR
SCHEMBL5142904 0.76
SCHEMBL2774742 0.76
SCHEMBL5165163 0.76 TSHR (0.40) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed