SCHEMBL13744776

SCHEMBL13744776

O=C(OCC(F)(F)F)C1(C(F)(F)F)CC2C=CC1C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.32
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13744453 0.89
SCHEMBL13744386 0.89
SCHEMBL13520500 0.88
SCHEMBL13744597 0.87 POLB (0.30)
SCHEMBL13744204 0.85
SCHEMBL13744600 0.84
SCHEMBL13744777 0.83
SCHEMBL13744387 0.82 USP2 (0.31)
SCHEMBL13445767 0.81
SCHEMBL14567551 0.81 CYP2C19 (0.33) HTTCYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed