SCHEMBL13744387

SCHEMBL13744387

O=C(OCC(F)(F)C(F)(F)C(F)(F)C(F)F)C1(C(F)(F)F)CC2C=CC1C2

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.31
MAPT P10636 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13744204 0.87
SCHEMBL13744600 0.86
SCHEMBL13744597 0.85 POLB (0.30) TSHR
SCHEMBL13744453 0.85
SCHEMBL10175353 0.84 USP2 (0.33) USP2MAPTTSHR
SCHEMBL13744776 0.82 HTT (0.32)
SCHEMBL13744386 0.80
SCHEMBL13744777 0.80
SCHEMBL13520500 0.79
SCHEMBL14567551 0.76 CYP2C19 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed