Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GBA2 | Q9HCG7 | 18/20 | 0.53 |
| ▸ | GBA1 | P04062 | 6/20 | 0.47 |
| ▸ | UGCG | Q16739 | 5/20 | 0.45 |
| ▸ | MGAM | O43451 | 2/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | SI | P14410 | 2/20 | 0.45 |
| ▸ | AGL | P35573 | 2/20 | 0.45 |
| ▸ | LCT | P09848 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16683713 | 0.78 | GBA2 (0.49) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL13668757 | 0.77 | GBA2 (0.57) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL14884086 | 0.76 | GBA2 (0.40) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL13672852 | 0.76 | GBA2 (0.52) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL13668762 | 0.75 | GBA2 (0.52) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL4422178 | 0.74 | GBA2 (0.54) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL13668763 | 0.73 | GBA2 (0.53) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL18780516 | 0.72 | GBA2 (0.44) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL11979412 | 0.72 | ALDH1A1 (0.40) | GBA2 | |
| SCHEMBL13668744 | 0.72 | GBA2 (0.51) | GBA2GBA1UGCGMGAMGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8426103-B2 | Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20090202946-A1 | POSITIVE RESIST COMPOSITION FOR USE WITH ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |