SCHEMBL1375003

SCHEMBL1375003

C=C(Cl)C(=O)OC(O)CC

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1373305 0.83 CHRM1 (0.32) TSHR
SCHEMBL11804919 0.83 TSHR (0.41) TSHR
SCHEMBL1905372 0.81 TSHR (0.58) TSHR
SCHEMBL25040 0.80 TSHR (0.43) TSHR
Methane SCHEMBL7698380 0.78 TSHR (0.42) TSHR
SCHEMBL28381594 0.78 TSHR (0.42) TSHR
SCHEMBL11807292 0.78 TSHR (0.39) TSHR
SCHEMBL28390679 0.78 TSHR (0.39) TSHR
SCHEMBL1131708 0.78 TSHR (0.33) TSHR
Alcohol SCHEMBL247501 0.77 TSHR (0.41) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105504153-B A kind of fluorine-containing hydrophobic association surface-active polyacrylamide and preparation method thereof 长江大学 2017-06-20 CN claimed
EP-3284771-B1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT TORAY INDUSTRIES (JP) 2023-08-30 EP disclosed
CN-107407869-B Photosensitive resin composition, method for producing resin cured film, and semiconductor device 东丽株式会社 2020-09-22 CN disclosed
US-10365559-B2 Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device TORAY INDUSTRIES, INC. (JP) 2019-07-30 US disclosed
EP-3284771-A1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT Toray Industries, Inc. (JP) 2018-02-21 EP disclosed
US-20180031970-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RESIN FILM, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2018-02-01 US disclosed
EP-3267254-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RESIN FILM, AND SEMICONDUCTOR DEVICE Toray Industries, Inc. (JP) 2018-01-10 EP disclosed
CN-107407869-A Photosensitive polymer combination, the manufacture method and semiconductor devices of resin cured film 东丽株式会社 2017-11-28 CN disclosed
US-8895676-B2 Resin composition and display device using the same TORAY INDUSTRIES, INC. (JP) 2014-11-25 US disclosed
US-20140191222-A1 RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME TORAY INDUSTRIES, INC. (JP) 2014-07-10 US disclosed
US-8709552-B2 Resin composition and display device using the same TORAY INDUSTRIES, INC. (JP) 2014-04-29 US disclosed
CN-102227474-B Resin composition and display device formed using same TORAY INDUSTRIES 2013-11-06 CN disclosed
US-20110284855-A1 RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME TORAY INDUSTRIES, INC. (JP) 2011-11-24 US disclosed
US-5248717-A Hydroxy-functional polyester diluents as additives in coating compositions THE SHERWIN-WILLIAMS COMPANY (US) 1993-09-28 US disclosed
US-5034454-A Copolymer of an unsaturated monomer with an active hydrogen group, a monomer with a sulfonic acid group and a carbonyl containing group PPG INDUSTRIES, INC. (US) 1991-07-23 US disclosed
US-5004828-A For blending with film-forming thermosetting and/or thermoplastic polymers; low-volatility automobile paints THE SHERWIN-WILLIAMS COMPANY (US) 1991-04-02 US disclosed
US-4008293-A ACRYLIC COPOLYMER, AMINOPLAST, BINDER PPG INDUSTRIES, INC. (US) 1977-02-15 US disclosed
US-3935342-A POLYMERIZATION WITH AN UNSATURATED SILYL MONOMER MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DT) 1976-01-27 US disclosed