SCHEMBL13764367

SCHEMBL13764367

OC(COC1CC2CCC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.35
CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14502476 0.81 ATM (0.32) ATMCYP19A1
SCHEMBL14502480 0.79 ATM (0.31) ATM
SCHEMBL18785751 0.76 ATM (0.36) ATMCYP19A1
SCHEMBL13240264 0.73
SCHEMBL2513868 0.73 MEN1 (0.32)
SCHEMBL14502477 0.73 ATM (0.31) ATM
SCHEMBL13764366 0.72
SCHEMBL10711483 0.71 ATM (0.42) ATMCYP19A1
SCHEMBL13923785 0.71 POLB (0.41)
SCHEMBL14556971 0.70 ATM (0.40) ATMCYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7579131-B2 Positive resist composition and method of forming resist pattern using the same FUJIFILM CORPORATION (JP) 2009-08-25 US disclosed
US-7195856-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-03-27 US disclosed