Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.32 |
| ▸ | DGKA | P23743 | 1/20 | 0.32 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.31 |
| ▸ | PRKCA | P17252 | 2/20 | 0.30 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.30 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.30 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12885013 | 0.96 | CYP19A1 (0.35) | CYP19A1FKBP1A | |
| SCHEMBL47437 | 0.90 | CYP19A1 (0.37) | CYP19A1 | |
| SCHEMBL47455 | 0.89 | CYP19A1 (0.39) | CYP19A1 | |
| SCHEMBL16904886 | 0.88 | CYP19A1 (0.35) | CYP19A1DGKA | |
| SCHEMBL16904905 | 0.86 | CYP19A1 (0.37) | CYP19A1DGKA | |
| SCHEMBL16904893 | 0.86 | CYP19A1 (0.37) | CYP19A1DGKA | |
| SCHEMBL47550 | 0.81 | CYP19A1 (0.38) | CYP19A1 | |
| SCHEMBL14984088 | 0.81 | CYP19A1 (0.35) | CYP19A1 | |
| SCHEMBL12216106 | 0.81 | HMGCR (0.31) | FKBP1A | |
| SCHEMBL3434644 | 0.80 | CYP19A1 (0.40) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7556908-B2 | Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-07 | — | — | US | disclosed |
| US-7232642-B2 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |