Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29212686 | 0.93 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL844797 | 0.89 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL3299307 | 0.85 | PTGS1 (0.32) | PTGS1PTGS2 | |
| SCHEMBL3295008 | 0.79 | — | — | |
| SCHEMBL16020793 | 0.79 | PTGS1 (0.35) | PTGS1PTGS2 | |
| SCHEMBL48081 | 0.79 | PTGS1 (0.35) | PTGS1PTGS2 | |
| SCHEMBL4878967 | 0.79 | PTGS1 (0.35) | PTGS1PTGS2 | |
| SCHEMBL20478201 | 0.79 | PTGS1 (0.35) | PTGS1PTGS2 | |
| SCHEMBL4802288 | 0.79 | PTGS1 (0.32) | PTGS1PTGS2 | |
| SCHEMBL21829137 | 0.78 | PTGS1 (0.31) | PTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7541134-B2 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-02 | — | — | US | disclosed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20070134916-A1 | Antireflection film composition, patterning process and substrate using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |