Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 2/20 | 0.41 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.41 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | FAAH | O00519 | 8/20 | 0.36 |
| ▸ | CES1 | P23141 | 5/20 | 0.34 |
| ▸ | GGPS1 | O95749 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | FDPS | P14324 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23170226 | 0.81 | CES2 (0.45) | CES2LPAR1LPAR3TSHRTHRB | |
| SCHEMBL799570 | 0.81 | CES2 (0.45) | CES2LPAR1LPAR3TSHRTHRB | |
| SCHEMBL13389445 | 0.79 | — | — | |
| SCHEMBL23351230 | 0.78 | CES2 (0.41) | CES2LPAR1LPAR3TSHRTHRB | |
| SCHEMBL24820838 | 0.77 | CES2 (0.42) | CES2LPAR1LPAR3TSHRTHRB | |
| SCHEMBL15424555 | 0.77 | — | — | |
| SCHEMBL1538923 | 0.77 | — | — | |
| SCHEMBL23381380 | 0.74 | LPAR1 (0.54) | CES2LPAR1LPAR3TSHRTHRB | |
| SCHEMBL24761193 | 0.74 | LPAR1 (0.54) | CES2LPAR1LPAR3TSHRTHRB | |
| SCHEMBL23034428 | 0.74 | LPAR1 (0.54) | CES2LPAR1LPAR3TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |