SCHEMBL13829152

SCHEMBL13829152

CCC(C)(C)C(=O)OC12CC3CC(OC(=O)CO)(CC(OC(=O)CO)(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 2/20 0.32
CYP17A1 P05093 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16282553 0.86 CYP17A1 (0.32) CYP19A1CYP17A1
SCHEMBL15182766 0.85 CYP17A1 (0.31) CYP19A1CYP17A1
SCHEMBL9924518 0.84 DPP4 (0.33) CYP19A1CYP17A1
SCHEMBL10062515 0.84
SCHEMBL9925221 0.83 CYP17A1 (0.32) CYP19A1CYP17A1
SCHEMBL11953063 0.83 CYP17A1 (0.32) CYP19A1CYP17A1
SCHEMBL13829172 0.82
SCHEMBL16659686 0.82 CYP17A1 (0.31) CYP19A1CYP17A1
SCHEMBL18685500 0.81 CYP17A1 (0.32) CYP19A1CYP17A1
SCHEMBL9925220 0.81 GAA (0.30) CYP19A1CYP17A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8808965-B2 Pattern forming method, pattern, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
US-20120288691-A1 PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-11-15 US disclosed