SCHEMBL9925221

SCHEMBL9925221

CCC(C)(C)C(=O)OC12CC3CC(OC(N)=O)(CC(OC(N)=O)(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.32
CYP19A1 P11511 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9925210 0.93 CYP17A1 (0.34) CYP17A1CYP19A1
SCHEMBL9924518 0.86 DPP4 (0.33) CYP17A1CYP19A1
SCHEMBL16282553 0.84 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL11953063 0.84 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL14295474 0.84 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL13829152 0.83 CYP19A1 (0.32) CYP17A1CYP19A1
SCHEMBL15182766 0.83 CYP17A1 (0.31) CYP17A1CYP19A1
SCHEMBL18685500 0.83 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL2601719 0.82
SCHEMBL10167861 0.82 CYP17A1 (0.30) CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed