SCHEMBL13840485

SCHEMBL13840485

CC(C)C(=O)OC1CC2CC(C(=O)OC3(C)C4CC5CC(C4)CC3C5)C1C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.32
CYP19A1 P11511 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL824322 0.88 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL13840486 0.85
SCHEMBL19751277 0.83
SCHEMBL19417866 0.82 CYP17A1 (0.38) CYP17A1CYP19A1
SCHEMBL14982790 0.82 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL13840479 0.81 SCN1A (0.30)
SCHEMBL47452 0.78 CYP19A1 (0.35) CYP17A1CYP19A1
SCHEMBL13361720 0.77
SCHEMBL824286 0.76
SCHEMBL13840477 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090117490-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKAKOGYO CO., LTD. (JP) 2009-05-07 US disclosed