⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL824286 | 0.91 | — | — | |
| SCHEMBL13840485 | 0.85 | CYP17A1 (0.32) | — | |
| SCHEMBL14982791 | 0.83 | — | — | |
| SCHEMBL13840477 | 0.81 | — | — | |
| SCHEMBL47432 | 0.81 | — | — | |
| SCHEMBL824322 | 0.79 | CYP17A1 (0.32) | — | |
| SCHEMBL13361720 | 0.78 | — | — | |
| SCHEMBL9608680 | 0.77 | ALDH1A1 (0.33) | — | |
| SCHEMBL13840479 | 0.77 | SCN1A (0.30) | — | |
| SCHEMBL824221 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090117490-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKAKOGYO CO., LTD. (JP) | 2009-05-07 | — | — | US | disclosed |