SCHEMBL13840944

SCHEMBL13840944

O=C(OCCOc1cccc2c(O)cccc12)C(SOOO)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.37
ESR1 P03372 11/20 0.35
ESR2 Q92731 11/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
JAK2 O60674 2/20 0.35
GAA P10253 2/20 0.35
MAPT P10636 2/20 0.35
USP2 O75604 1/20 0.35
ALOX15 P16050 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
HSD17B10 Q99714 1/20 0.35
LMNA P02545 1/20 0.33
POLB P06746 1/20 0.32
KCNJ11 Q14654 1/20 0.31
BCL2 P10415 1/20 0.31
BCL2L1 Q07817 1/20 0.31
MCL1 Q07820 1/20 0.31
BAD Q92934 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840931 0.89 IDO1 (0.37) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL2603118 0.88 IDO1 (0.39) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL13840940 0.87 ALDH1A1 (0.43) MEN1KMT2AMAPTPOLBBCL2
SCHEMBL14009479 0.82 IDO1 (0.40) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL13840945 0.82 CA1 (0.35) GAAMAPTSMN1; SMN2KDM4EALDH1A1
SCHEMBL2602865 0.81 IDO1 (0.35) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL12128715 0.79 ESR1 (0.44) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL13840885 0.78 ESR1 (0.37) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL13842661 0.77 IDO1 (0.39) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL13842655 0.77 IDO1 (0.39) IDO1ESR1ESR2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed