⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14204563 | 0.73 | — | — | |
| SCHEMBL5270532 | 0.70 | — | — | |
| SCHEMBL13492001 | 0.70 | — | — | |
| SCHEMBL24768892 | 0.70 | — | — | |
| SCHEMBL13856021 | 0.70 | — | — | |
| SCHEMBL13856063 | 0.67 | — | — | |
| SCHEMBL6119389 | 0.63 | — | — | |
| SCHEMBL3973408 | 0.63 | — | — | |
| SCHEMBL13856075 | 0.61 | — | — | |
| SCHEMBL13856073 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7537880-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20080118860-A1 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-22 | — | — | US | disclosed |