⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13856050 | 0.73 | — | — | |
| SCHEMBL14204553 | 0.71 | — | — | |
| SCHEMBL19829287 | 0.68 | — | — | |
| SCHEMBL14204583 | 0.68 | — | — | |
| SCHEMBL5270532 | 0.64 | — | — | |
| SCHEMBL23963202 | 0.64 | — | — | |
| SCHEMBL6251278 | 0.64 | — | — | |
| SCHEMBL14204579 | 0.63 | — | — | |
| SCHEMBL14204562 | 0.63 | POLB (0.30) | — | |
| SCHEMBL16905009 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| WO-2013111667-A1 | FLUORINE-CONTAINING SULFONIC ACID SALT, FLUORINE-CONTAINING SULFONIC ACID SALT RESIN, RESIST COMPOSITION, AND PATTERN FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2013-08-01 | — | — | WO | disclosed |
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |