⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13857641 | 0.88 | — | — | |
| SCHEMBL13857649 | 0.79 | — | — | |
| SCHEMBL10127074 | 0.62 | — | — | |
| SCHEMBL926802 | 0.59 | TAS1R3 (0.35) | — | |
| SCHEMBL13623384 | 0.58 | CA12 (0.32) | — | |
| Water SCHEMBL22129214 | 0.56 | TAS1R3 (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL12487556 | 0.56 | TAS1R3 (0.33) | — | |
| SCHEMBL107094 | 0.56 | TAS1R3 (0.33) | — | |
| Bromide SCHEMBL9813323 | 0.56 | TAS1R3 (0.33) | — | |
| Bromide SCHEMBL9813316 | 0.56 | TAS1R3 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7527911-B2 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7527911-B2 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20070196766-A1 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070196766-A1 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |