⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13889989 | 0.85 | — | — | |
| SCHEMBL18022248 | 0.84 | — | — | |
| SCHEMBL13829287 | 0.83 | — | — | |
| SCHEMBL18023686 | 0.80 | — | — | |
| SCHEMBL12797108 | 0.79 | FKBP1A (0.30) | — | |
| SCHEMBL13641645 | 0.78 | HMGCR (0.36) | — | |
| SCHEMBL12555561 | 0.77 | BCHE (0.32) | — | |
| SCHEMBL15978047 | 0.77 | FKBP1A (0.34) | — | |
| SCHEMBL13641653 | 0.76 | — | — | |
| SCHEMBL3434648 | 0.76 | EPHX1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9298093-B2 | Polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2016-03-29 | — | — | US | disclosed |
| US-20120288794-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-11-15 | — | — | US | disclosed |