SCHEMBL138942

SCHEMBL138942

C=C(OC)C(=O)OCCOCCOCCO

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.44
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
TSHR P16473 8/20 0.39
MAPK1 P28482 1/20 0.39
ALDH1A1 P00352 5/20 0.36
TP53 P04637 2/20 0.36
HIF1A Q16665 2/20 0.36
HSD17B10 Q99714 1/20 0.36
HTT P42858 1/20 0.35
MAPT P10636 1/20 0.35
EPHX2 P34913 1/20 0.33
ACHE P22303 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9190025 1.00 THRB (0.44) THRBMEN1KMT2ATSHRMAPK1
SCHEMBL9185430 1.00 THRB (0.44) THRBMEN1KMT2ATSHRMAPK1
SCHEMBL6759630 1.00 THRB (0.44) THRBMEN1KMT2ATSHRMAPK1
SCHEMBL9184473 1.00 THRB (0.44) THRBMEN1KMT2ATSHRMAPK1
SCHEMBL28668506 1.00 THRB (0.44) THRBMEN1KMT2ATSHRMAPK1
SCHEMBL260452 1.00 THRB (0.44) THRBMEN1KMT2ATSHRMAPK1
SCHEMBL36395 0.88 TSHR (0.41) THRBKMT2ATSHRALDH1A1HSD17B10
SCHEMBL27790875 0.86 THRB (0.46) THRBMEN1KMT2ATSHRALDH1A1
Ethylene Glycol SCHEMBL27549614 0.86 TSHR (0.40) THRBKMT2ATSHRALDH1A1HSD17B10
SCHEMBL28963874 0.86 MEN1 (0.48) THRBMEN1KMT2ATSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 843 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US claimed
EP-3440142-B1 POLYURETHANE-POLYACRYLATE HYBRID SYSTEMS FOR PACKAGING INKS AND COATINGS SUN CHEMICAL CORP (US) 2023-02-08 EP claimed
CN-115279840-A Surface-coated inorganic particles, method for producing same, and organic solvent dispersion having surface-coated inorganic particles dispersed therein 石原产业株式会社 2022-11-01 CN claimed
CN-111247609-B Conductive polymer dispersions for improved reliability 凯米特电子公司 2022-09-27 CN claimed
US-11400741-B2 Group IV metal chelates and their use in radiation curable ink and coating compositions SUN CHEMICAL CORPORATION (US) 2022-08-02 US claimed
CN-114678597-A Lithium ion battery 日立化成株式会社 2022-06-28 CN claimed
CN-114133898-A High-permeability low-sensitization medical pressure-sensitive adhesive and preparation method thereof 佛山市领固胶粘科技有限公司 2022-03-04 CN claimed
US-20200391535-A1 GROUP IV METAL CHELATES AND THEIR USE IN RADIATION CURABLE INK AND COATING COMPOSITIONS SUN CHEMICAL CORPORATION (US) 2020-12-17 US claimed
EP-3737562-A1 GROUP IV METAL CHELATES AND THEIR USE IN RADIATION CURABLE INK AND COATING COMPOSITIONS Sun Chemical Corporation (US) 2020-11-18 EP claimed
US-20140050768-A1 Copper-Containing Metal Pigments with a Metal Oxide Layer and a Plastic Layer, Method for the Production Thereof, Coating Agent and Coated Object ECKART GMBH (DE) 2014-02-20 US claimed
US-20140037918-A1 ULTRAVIOLET RAY CURABLE INK COMPOSITION FOR USE IN INK JET METHOD AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2014-02-06 US claimed
EP-2692806-A1 Ultraviolet ray curable ink composition for use in ink jet method and recorded object Seiko Epson Corporation (JP) 2014-02-05 EP claimed
EP-2631080-A1 Recording material Seiko Epson Corporation (JP) 2013-08-28 EP claimed
EP-2623570-A1 Ultraviolet-curable composition for inkjet and recording material Seiko Epson Corporation (JP) 2013-08-07 EP claimed
US-20130196126-A1 ULTRAVIOLET-CURABLE COMPOSITION FOR INKJET AND RECORDING MATERIAL SEIKO EPSON CORPORATION (JP) 2013-08-01 US claimed
US-20130196125-A1 RECORDING MATERIAL SEIKO EPSON CORPORATION (JP) 2013-08-01 US claimed
CN-101023543-A Binder resin composition for nonaqueous electrolyte energy device electrode, and nonaqueous electrolyte energy device HITACHI CHEMICAL CO LTD (JP) 2007-08-22 CN claimed
US-20040014898-A1 Water-absorptive contact lens and method of producing the same MENICON CO., LTD. (JP) 2004-01-22 US claimed
EP-1378769-A2 Water-absorptive contact lens and method of producing the same Menicon Co., Ltd. (JP) 2004-01-07 EP claimed