SCHEMBL13898546

SCHEMBL13898546

CCC(=O)c1cc(C(C)CC)ccc1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.56
GAA P10253 5/20 0.56
HPGD P15428 3/20 0.56
HSD17B10 Q99714 3/20 0.56
USP2 O75604 1/20 0.56
PKM P14618 1/20 0.56
ALOX15 P16050 1/20 0.56
HSP90AB1 P08238 2/20 0.49
HSP90AA1 P07900 1/20 0.49
HDAC4 P56524 1/20 0.49
HDAC2 Q92769 1/20 0.49
HDAC8 Q9BY41 1/20 0.49
LMNA P02545 2/20 0.45
HTT P42858 1/20 0.45
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
MAPT P10636 2/20 0.44
TP53 P04637 1/20 0.44
MAPK1 P28482 1/20 0.44
HMGCR P04035 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9963753 0.89 ALDH1A1 (0.54) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL13898610 0.87 ALDH1A1 (0.53) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL27778658 0.86 HSP90AB1 (0.64) ALDH1A1GAAHPGDHSD17B10ALOX15
SCHEMBL9908617 0.85 ALDH1A1 (0.57) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL5885088 0.85 ALDH1A1 (0.57) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL13898629 0.84 ALDH1A1 (0.50) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL13898427 0.83 ALDH1A1 (0.60) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL13898631 0.82 ALDH1A1 (0.48) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL13898426 0.82 HTT (0.51) ALDH1A1GAAHPGDHSD17B10USP2
SCHEMBL11315020 0.82 GAA (0.54) ALDH1A1GAAHPGDHSD17B10USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed