SCHEMBL1392503

SCHEMBL1392503

Clc1[c]cc(Cl)c2c(Cl)[c]cc(Cl)c12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1392215 0.77
SCHEMBL58243 0.71 CYP3A4 (0.35)
SCHEMBL8982776 0.67 TSHR (0.33)
SCHEMBL1024917 0.65
SCHEMBL11530245 0.65
SCHEMBL260747 0.65
SCHEMBL1392372 0.63
SCHEMBL3392312 0.62
SCHEMBL3393602 0.62 KDM4E (0.32)
SCHEMBL1393111 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8480926-B2 Liquid-crystalline compound and organic semiconductor device containing the compound JNC CORPORATION (JP) 2013-07-09 US disclosed
US-20120007062-A1 NOVEL LIQUID-CRYSTALLINE COMPOUND AND ORGANIC SEMICONDUCTOR DEVICE CONTAINING THE COMPOUND JNC CORPORATION (JP) 2012-01-12 US disclosed
EP-0113252-B1 PROCESS FOR PRODUCING BLOCK COPOLYAMIDE TORAY INDUSTRIES, INC. (JP) 1991-08-07 EP disclosed
US-4507465-A IMPACT STRENGTH TORAY INDUSTRIES, INC. (JP) 1985-03-26 US disclosed
EP-0113252-A2 Process for producing block copolyamide TORAY INDUSTRIES, INC. (JP) 1984-07-11 EP disclosed