⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1393080 | 0.87 | — | — | |
| SCHEMBL5699154 | 0.80 | TMEM97 (0.32) | — | |
| SCHEMBL4117051 | 0.74 | CTDSP1 (0.31) | — | |
| SCHEMBL15333825 | 0.72 | PABPC1 (0.33) | — | |
| Methacrylic Acid SCHEMBL15737870 | 0.72 | TSHR (0.33) | — | |
| SCHEMBL1811076 | 0.70 | — | — | |
| SCHEMBL4117049 | 0.70 | — | — | |
| SCHEMBL15955750 | 0.68 | CTDSP1 (0.32) | — | |
| SCHEMBL244978 | 0.68 | — | — | |
| SCHEMBL1393894 | 0.68 | CD81 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10029485-B2 | Ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-9822207-B2 | Silicon-containing highly branched polymer and curable composition containing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20170080719-A1 | INK JET RECORDING METHOD | SEIKO EPSON CORP (JP) | 2017-03-23 | — | — | US | disclosed |
| US-9539823-B2 | Ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-9523792-B2 | Polarizer having protection films in two sides and optical device comprising the same | LG CHEM, LTD. (KR) | 2016-12-20 | — | — | US | disclosed |
| US-9487685-B2 | Adhesive for polarizing plate and polarizing plate including the same | LG CHEM, LTD. (KR) | 2016-11-08 | — | — | US | disclosed |
| US-20150336401-A1 | INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-20150299500-A1 | CURABLE COMPOSITION CONTAINING SILICON-CONTAINING HIGHLY-BRANCHED POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-10-22 | — | — | US | disclosed |
| US-9126431-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| US-20150210797-A1 | SILICON-CONTAINING HIGHLY BRANCHED POLYMER AND CURABLE COMPOSITION CONTAINING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-07-30 | — | — | US | disclosed |
| US-8968862-B2 | Polarizer having protection films in two sides and optical device comprising the same | LG CHEM, LTD. (KR) | 2015-03-03 | — | — | US | disclosed |
| US-20140072731-A1 | ADHESIVE FOR POLARIZING PLATE AND POLARIZING PLATE INCLUDING THE SAME | LG CHEM, LTD. (KR) | 2014-03-13 | — | — | US | disclosed |
| EP-2371565-B1 | Image forming method and ink jet recording device | SEIKO EPSON CORP (JP) | 2014-03-12 | — | — | EP | disclosed |
| US-20140055543-A1 | INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2014-02-27 | — | — | US | disclosed |
| US-8616670-B2 | Image forming method and ink jet recording device | SEIKO EPSON CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-20130279003-A1 | POLARIZER HAVING PROTECTION FILMS IN TWO SIDES AND OPTICAL DEVICE COMPRISING THE SAME | Shanjin Optoelectronics (Nanjing) Co., Ltd. (CN) | 2013-10-24 | — | — | US | disclosed |
| US-8556404-B2 | Photocurable ink composition for ink jet recording, ink jet recording method, and recorded material | SEIKO EPSON CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |
| US-20120007912-A1 | INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION | 2012-01-12 | — | — | US | disclosed |
| US-20110242183-A1 | IMAGE FORMING METHOD AND INK JET RECORDING DEVICE | SEIKO EPSON CORPORATION | 2011-10-06 | — | — | US | disclosed |
| US-20110234681-A1 | PHOTOCURABLE INK COMPOSITION FOR INK JET RECORDING, INK JET RECORDING, AND RECORDED MATERIAL | SEIKO EPSON CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |