⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14890603 | 1.00 | LMNA (0.44) | — | |
| SCHEMBL21332235 | 0.97 | LMNA (0.47) | — | |
| SCHEMBL52890 | 0.97 | — | — | |
| Ammonia Solution, Strong SCHEMBL29481609 | 0.93 | — | — | |
| Urea SCHEMBL2337820 | 0.93 | LMNA (0.44) | — | |
| SCHEMBL25275469 | 0.93 | — | — | |
| Iodide SCHEMBL31148880 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL14674085 | 0.93 | — | — | |
| Urea SCHEMBL8755533 | 0.93 | LMNA (0.44) | — | |
| SCHEMBL9418692 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3293493-B1 | STERILIZATION INDICATING DEVICE | JP LABORATORIES INC (US) | 2023-06-14 | — | — | EP | disclosed |
| US-20210322587-A1 | Monitoring System Based on Etching of Metals | JP LABORATORIES INC. | 2021-10-21 | — | — | US | disclosed |
| US-11071795-B2 | Indicating devices based on etching of metals | JP LABORATORIES INC. (US) | 2021-07-27 | — | — | US | disclosed |
| EP-3293493-A1 | A MONITORING SYSTEM BASED ON ETCHING OF METALS | Patel, G (US) | 2018-03-14 | — | — | EP | disclosed |
| US-20180024011-A1 | Indicating Devices Based on Etching of Metals | JP LABORATORIES INC. | 2018-01-25 | — | — | US | disclosed |
| EP-2288879-B1 | A MONITORING SYSTEM BASED ON ETCHING OF METALS | PATEL G (US) | 2018-01-24 | — | — | EP | disclosed |
| US-20170261381-A1 | Monitoring system based on etching of metals | JP LABORATORIES (US) | 2017-09-14 | — | — | US | disclosed |
| US-20170252471-A1 | Indicating Devices Based onEtching of Metals | JP LABORATORIES (US) | 2017-09-07 | — | — | US | disclosed |
| US-20140154808-A1 | MONITORING SYSTEM BASED ON ETCHING OF METALS | PATEL GORDHANBHAI N (US) | 2014-06-05 | — | — | US | disclosed |
| US-8343437-B2 | Monitoring system based on etching of metals | JP LABORATORIES, INC. (US) | 2013-01-01 | — | — | US | disclosed |
| EP-2288879-A1 | A MONITORING SYSTEM BASED ON ETCHING OF METALS | Patel, G (US) | 2011-03-02 | — | — | EP | disclosed |
| US-20090301382-A1 | Monitoring System Based on Etching of Metals | JP LABORATORIES, INC | 2009-12-10 | — | — | US | disclosed |
| WO-2009149243-A1 | A MONITORING SYSTEM BASED ON ETCHING OF METALS | PATEL G (US) | 2009-12-10 | — | — | WO | disclosed |