Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 3/20 | 0.50 |
| ▸ | GRM5 | P41594 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.42 |
| ▸ | EGFR | P00533 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 3/20 | 0.40 |
| ▸ | GRM4 | Q14833 | 2/20 | 0.40 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.40 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.40 |
| ▸ | APP | P05067 | 1/20 | 0.40 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.40 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL429875 | 0.95 | KCNH2 (0.49) | KCNH2GRM5L3MBTL1EGFRTDP1 | |
| SCHEMBL29368538 | 0.95 | KCNH2 (0.49) | KCNH2GRM5L3MBTL1EGFRTDP1 | |
| SCHEMBL15486254 | 0.95 | KCNH2 (0.51) | KCNH2GRM5L3MBTL1EGFRTDP1 | |
| SCHEMBL1470511 | 0.77 | APP (0.44) | KCNH2GRM5L3MBTL1TDP1ATM | |
| SCHEMBL3803310 | 0.75 | GRM5 (0.46) | KCNH2GRM5L3MBTL1EGFRTDP1 | |
| SCHEMBL26259628 | 0.75 | KCNH2 (0.51) | KCNH2GRM5L3MBTL1EGFRTDP1 | |
| SCHEMBL30165319 | 0.74 | APP (0.44) | KCNH2GRM5L3MBTL1TDP1ATM | |
| SCHEMBL551446 | 0.74 | APP (0.44) | KCNH2GRM5L3MBTL1TDP1ATM | |
| SCHEMBL26259291 | 0.73 | MAPT (0.53) | KCNH2GRM5L3MBTL1EGFRPDGFRB | |
| SCHEMBL29357652 | 0.73 | APP (0.67) | KCNH2GRM5L3MBTL1TDP1ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10662274-B2 | Self-immolative polymers, articles thereof, and methods of making and using same | GEORGIA TECH RESEARCH CORPORATION (US) | 2020-05-26 | — | — | US | claimed |
| US-20180155483-A1 | SELF-IMMOLATIVE POLYMERS, ARTICLES THEREOF, AND METHODS OF MAKING AND USING SAME | GEORGIA TECH RESEARCH CORPORATION | 2018-06-07 | — | — | US | claimed |
| US-5374500-A | Positive photoresist composition containing photoacid generator and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-12-20 | — | — | US | claimed |
| US-5055439-A | PHOTOACID GENERATING COMPOSITION AND SENSITIZER THEREFOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-10-08 | — | — | US | claimed |
| EP-0435531-A2 | Photoacid generating composition and sensitizer therefor | International Business Machines Corporation (US) | 1991-07-03 | — | — | EP | claimed |
| JP-3200257-A | — | — | None | — | — | JP | disclosed |
| US-11988963-B2 | Low temperature cure photoimageable dielectric compositions and methods of their use | NAWROCKI DANIEL J (US) | 2024-05-21 | — | — | US | disclosed |
| US-11773252-B1 | Transient polymer blends | MORSECORP, Inc. (US) | 2023-10-03 | — | — | US | disclosed |
| US-20220146936-A1 | LOW TEMPERATURE CURE PHOTOIMAGEABLE DIELECTRIC COMPOSITIONS AND METHODS OF THEIR USE | NAWROCKI DANIEL J (US) | 2022-05-12 | — | — | US | disclosed |
| US-20210163731-A1 | TRANSIENT POLYMER FORMULATIONS, ARTICLES THEREOF, AND METHODS OF MAKING AND USING SAME | GEORGIA TECH RESEARCH CORPORATION | 2021-06-03 | — | — | US | disclosed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| US-10662274-B2 | Self-immolative polymers, articles thereof, and methods of making and using same | GEORGIA TECH RESEARCH CORPORATION (US) | 2020-05-26 | — | — | US | disclosed |
| EP-1769286-A2 | OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | Ciba Specialty Chemicals Holding Inc. (CH) | 2007-04-04 | — | — | EP | disclosed |
| WO-2006008250-A2 | OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2006-01-26 | — | — | WO | disclosed |
| US-20050185232-A1 | Volume hologram recording photosensitive composition and its use | NIPPON PAINT CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| US-5338818-A | Silicon containing positive resist for DUV lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-08-16 | — | — | US | disclosed |
| US-5272042-A | Positive photoresist system for near-UV to visible imaging | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-12-21 | — | — | US | disclosed |
| US-5055439-A | PHOTOACID GENERATING COMPOSITION AND SENSITIZER THEREFOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-10-08 | — | — | US | disclosed |
| JP-H03200257-A | PHOTOSENSITIVE ACID GENERATING COMPOSITION AND SENSITIZER THEREFOR | INTERNATL BUSINESS MACH CORP <IBM> | 1991-09-02 | — | — | JP | disclosed |
| EP-0435531-A2 | Photoacid generating composition and sensitizer therefor | International Business Machines Corporation (US) | 1991-07-03 | — | — | EP | disclosed |