SCHEMBL1398161

SCHEMBL1398161

C=COCC(C)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3166933 0.84 TSHR (0.32)
SCHEMBL108605 0.81
SCHEMBL1275945 0.77
SCHEMBL16318404 0.76
SCHEMBL15829089 0.75
SCHEMBL15715872 0.75
SCHEMBL16373213 0.75
Vinyl Ether SCHEMBL1398163 0.74 TSHR (0.38)
Methyl Alcohol SCHEMBL28159056 0.74
SCHEMBL108379 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 257 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5576407-A Copolymers of hydroxyalkyl vinyl ethers for use in detergents and cleaning agents BASF AKTIENGESELLSCHAFT (DE) 1996-11-19 US claimed
EP-4692141-A1 COPOLYMER AND COATING COMPOSITION OR RESIST COMPOSITION CONTAINING COPOLYMER DIC Corporation (JP) 2026-02-11 EP disclosed
CN-114846040-B Polymer and coating composition comprising the same DIC株式会社 2025-05-16 CN disclosed
CN-116323849-B Adhesive composition and laminated film using same DIC株式会社 2025-05-16 CN disclosed
WO-2024209937-A1 COPOLYMER AND COATING COMPOSITION OR RESIST COMPOSITION CONTAINING COPOLYMER DIC株式会社 2024-10-10 WO disclosed
CN-116034143-B Polymer, coating composition, resist composition and article DIC株式会社 2024-09-24 CN disclosed
US-20240263025-A1 LEVELING AGENT BEING SILICONE CHAIN-CONTAINING POLYMER, COATING COMPOSITION, RESIST COMPOSITION AND ARTICLE DIC CORPORATION (JP) 2024-08-08 US disclosed
US-12038557-B2 Anti-reflection film DAICEL CORPORATION (JP) 2024-07-16 US disclosed
WO-2024141344-A1 MULTISTAGE POLYMER COMPOSITIONS AND COATINGS COMPRISING CURED MULTISTAGE POLYMER COMPOSITIONS ARKEMA FRANCE (FR) 2024-07-04 WO disclosed
EP-4393982-A1 MULTISTAGE POLYMER COMPOSITIONS AND COATINGS COMPRISING CURED MULTISTAGE POLYMER COMPOSITIONS ARKEMA FRANCE (FR) 2024-07-03 EP disclosed
US-20130030078-A1 RADICAL-POLYMERIZABLE RESIN, RADICAL-POLYMERIZABLE RESIN COMPOSITION, AND CURED MATERIAL THEREOF DAICEL CORPORATION (JP) 2013-01-31 US disclosed
US-20120309930-A1 CATIONICALLY POLYMERIZABLE RESIN, CATIONICALLY POLYMERIZABLE RESIN COMPOSITION, AND CURED PRODUCTS THEREOF DAICEL CORPORATION (JP) 2012-12-06 US disclosed
EP-1980565-B1 Oil soluble radiation curable metal-containing compositions SARTOMER TECHNOLOGY USA LLC (US) 2011-03-02 EP disclosed
EP-1189994-B1 OIL SOLUBLE RADIATION CURABLE METAL-CONTAINING COMPOUNDS AND COMPOSITIONS SARTOMER CO INC (US) 2009-03-18 EP disclosed
EP-1980565-A1 Oil soluble radiation curable metal-containing compounds and compositions SARTOMER COMPANY, INC. (US) 2008-10-15 EP disclosed
US-6399672-B1 OIL SOLUBLE UNSATURATED COMPOUNDS AND PHOTOINITIATORS SARTOMER TECHNOLOGIES CO., INC. 2002-06-04 US disclosed
US-5576407-A Copolymers of hydroxyalkyl vinyl ethers for use in detergents and cleaning agents BASF AKTIENGESELLSCHAFT (DE) 1996-11-19 US disclosed
EP-0603236-B1 COPOLYMERS PRODUCED FROM HYDROXYALKYL VINYL ETHERS, AND THE USE OF HOMOPOLYMERS AND COPOLYMERS OF HYDROXYALKYL VINYL ETHERS IN WASHING AND CLEANING AGENTS BASF AG (DE) 1995-11-29 EP disclosed
EP-0603236-A1 COPOLYMERS PRODUCED FROM HYDROXYALKYL VINYL ETHERS, AND THE USE OF HOMOPOLYMERS AND COPOLYMERS OF HYDROXYALKYL VINYL ETHERS IN WASHING AND CLEANING AGENTS. BASF AG (DE) 1994-06-29 EP disclosed
WO-1993006142-A1 COPOLYMERS PRODUCED FROM HYDROXYALKYL VINYL ETHERS, AND THE USE OF HOMOPOLYMERS AND COPOLYMERS OF HYDROXYALKYL VINYL ETHERS IN WASHING AND CLEANING AGENTS BASF AKTIENGESELLSCHAFT (DE) 1993-04-01 WO disclosed