Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TACR1 | P25103 | 2/20 | 0.42 |
| ▸ | TACR3 | P29371 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CASR | P41180 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15014707 | 0.85 | SMN1; SMN2 (0.46) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL259375 | 0.85 | CHRM2 (0.43) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL15025059 | 0.84 | TACR1 (0.42) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL13985636 | 0.82 | TACR1 (0.41) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL4811090 | 0.82 | TACR1 (0.39) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL13980424 | 0.81 | SMN1; SMN2 (0.43) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL19986235 | 0.80 | SMN1; SMN2 (0.47) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL15025227 | 0.80 | TACR1 (0.42) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL13985633 | 0.80 | TACR1 (0.40) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 | |
| SCHEMBL15025258 | 0.79 | TACR1 (0.41) | TACR1TACR3POLBSMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |
| US-7468236-B2 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-23 | — | — | US | disclosed |
| US-20070087287-A1 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-04-19 | — | — | US | disclosed |