SCHEMBL13994416

SCHEMBL13994416

CCOc1cc(C(F)(F)F)ccc1BC(CC)CC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 2/20 0.44
▸ CYP2C19 P33261 2/20 0.44
▸ CYP2C9 P11712 1/20 0.44
▸ L3MBTL1 Q9Y468 2/20 0.42
▸ LMNA P02545 1/20 0.42
▸ MAPT P10636 1/20 0.42
▸ ATM Q13315 1/20 0.42
▸ PDE2A O00408 3/20 0.40
▸ HPGD P15428 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.37
▸ MBOAT4 Q96T53 1/20 0.35
▸ PPARG P37231 1/20 0.35
▸ PPARD Q03181 1/20 0.35
▸ PPARA Q07869 1/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ CETP P11597 1/20 0.34
▸ CRHR1 P34998 3/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13994411 0.73 L3MBTL1 (0.45) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL24987672 0.73 CYP1A2 (0.49) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL13696455 0.73 CYP2C19 (0.51) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL12126027 0.73 CYP1A2 (0.51) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL4524912 0.71 CYP2C19 (0.50) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL28458165 0.71 CYP2C19 (0.50) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL957465 0.71 CYP2C19 (0.50) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL12674477 0.71 CYP1A2 (0.56) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL10183556 0.70 CYP2C19 (0.49) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA
SCHEMBL12668253 0.70 CYP1A2 (0.52) CYP1A2CYP2C19CYP2C9L3MBTL1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7470015-B2 Inkjet-recording ink composition and image-forming process FUJIFILM CORPORATION (JP) 2008-12-30 — — US disclosed
US-7229737-B2 Photopolymerizable composition and recording material and recording process using the same FUJIFILM CORPORATION (JP) 2007-06-12 — — US disclosed
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