Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.59 |
| ▸ | TP53 | P04637 | 3/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.54 |
| ▸ | THRB | P10828 | 3/20 | 0.53 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | LDHA | P00338 | 1/20 | 0.32 |
| ▸ | SRR | Q9GZT4 | 1/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | MGAM | O43451 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | SI | P14410 | 1/20 | 0.30 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7556954 | 0.92 | TSHR (0.61) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL1150833 | 0.89 | TSHR (0.67) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Acetoacetic Acid SCHEMBL21044399 | 0.87 | TSHR (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL13101230 | 0.86 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL7559377 | 0.85 | TSHR (0.45) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14500151 | 0.84 | TSHR (0.47) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL16609326 | 0.82 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL93462 | 0.82 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL30604742 | 0.82 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL33640 | 0.82 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4245817-A1 | INKJET INK COMPOSITION, RECORDED MATTER, INKJET RECORDING METHOD, AND INKJET RECORDING SYSTEM | Konica Minolta, Inc. (JP) | 2023-09-20 | — | — | EP | disclosed |
| EP-3346338-B1 | METHOD FOR STRIPPING RESIST FILM FROM METAL PLATE AND METHOD FOR MANUFACTURING ETCHED METAL PLATE | NIPPON STEEL NISSHIN CO LTD (JP) | 2020-05-06 | — | — | EP | disclosed |
| US-10156789-B2 | Method for stripping resist film from metal plate and method for manufacturing etched metal plate | NISSHIN STEEL CO., LTD. (JP) | 2018-12-18 | — | — | US | disclosed |
| US-20180253009-A1 | METHOD FOR STRIPPING RESIST FILM FROM METAL PLATE AND METHOD FOR MANUFACTURING ETCHED METAL PLATE | NISSHIN STEEL CO., LTD. (JP) | 2018-09-06 | — | — | US | disclosed |
| EP-3346338-A1 | METHOD FOR STRIPPING RESIST FILM FROM METAL PLATE AND METHOD FOR MANUFACTURING ETCHED METAL PLATE | Nisshin Steel Co., Ltd. (JP) | 2018-07-11 | — | — | EP | disclosed |
| US-20170145216-A1 | RHODAMINE-BASED COLORING COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-25 | — | — | US | disclosed |
| US-20170145216-A1 | RHODAMINE-BASED COLORING COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-25 | — | — | US | disclosed |
| US-20170137553-A1 | GRAFT POLYMER, RESIN COLORED MATTER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION CONTAINING RESIN COLORED MATTER | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-18 | — | — | US | disclosed |
| US-20170137553-A1 | GRAFT POLYMER, RESIN COLORED MATTER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION CONTAINING RESIN COLORED MATTER | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-18 | — | — | US | disclosed |
| EP-3165541-A1 | GRAFT POLYMER, RESIN COLORED MATTER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION CONTAINING RESIN COLORED MATTER | Wako Pure Chemical Industries, Ltd. (JP) | 2017-05-10 | — | — | EP | disclosed |
| CN-101978001-B | Ink-jet ink composition for etching resist | NISSHIN STEEL CO LTD | 2013-08-28 | — | — | CN | disclosed |
| US-8425790-B2 | Ink-jet ink composition for etching resist | NISSHIN STEEL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120058273-A1 | INK COMPOSITION, AND METHOD OF FORMING PATTERN, COLOR FILTER AND METHOD OF PREPARING COLOR FILTER USING THE SAME | DONGWOO FINE-CHEM CO., LTD. (KR) | 2012-03-08 | — | — | US | disclosed |
| CN-101978001-A | Ink-jet ink composition for etching resist | NISSHIN STEEL CO LTD | 2011-02-16 | — | — | CN | disclosed |
| US-20110024392-A1 | INK-JET INK COMPOSITION FOR ETCHING RESIST | TOKYO PRINTING INK MFG. CO., LTD. (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20100273931-A1 | DECARBOXYLATING BLOCK COPOLYMERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-10-28 | — | — | US | disclosed |
| WO-2009073702-A1 | DECARBOXYLATING BLOCK COPOLYMERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-06-11 | — | — | WO | disclosed |
| EP-0756208-B1 | Resin composition for electrophotographic toner, and toner comprising it | MITSUI CHEMICALS INC (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6011119-A | RESIN COMPOSITION SHOWS EXCELLENT CHARGING CHARACTERISTICS WITHOUT A CHARGE CONTROL AGENT; HIGH AND LOW MOLECULAR WEIGHT ADDITION POLYMERS AT LEAST ONE OF WHICH IS FROM AN UNSATURATED ANHYDRIDE AND AN ACRYLOYLOXYALKYL DICARBOXYLIC ACID ESTER | MITSUI CHEMICALS, INC. (JP) | 2000-01-04 | — | — | US | disclosed |
| EP-0756208-A1 | Resin composition for electrophotographic toner, and toner comprising it | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1997-01-29 | — | — | EP | disclosed |