Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.67 |
| ▸ | TP53 | P04637 | 3/20 | 0.67 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.67 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.67 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.60 |
| ▸ | HPGD | P15428 | 1/20 | 0.54 |
| ▸ | THRB | P10828 | 4/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | MGAM | O43451 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | SI | P14410 | 1/20 | 0.39 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | DGKA | P23743 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.31 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9155974 | 0.91 | TSHR (0.68) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL139984 | 0.89 | TSHR (0.59) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL93462 | 0.87 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL13101230 | 0.87 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL218670 | 0.87 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL30604742 | 0.87 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL303596 | 0.86 | TSHR (0.67) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL17119709 | 0.86 | TSHR (0.67) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL900042 | 0.85 | TSHR (0.80) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene SCHEMBL1165263 | 0.85 | TSHR (0.80) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12015122-B2 | Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives | ENEVATE CORPORATION (US) | 2024-06-18 | — | — | US | claimed |
| US-20210218059-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2021-07-15 | — | — | US | claimed |
| US-20190190070-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2019-06-20 | — | — | US | claimed |
| WO-2019113528-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION (US) | 2019-06-13 | — | — | WO | claimed |
| US-20240429448-A1 | Silicon-Based Energy Storage Devices With Carboxylic Ether, Carboxylic Acid Based Salt, or Acrylate Electrolyte Containing Electrolyte Additives | ENEVATE CORP (US) | 2024-12-26 | — | — | US | disclosed |
| US-12015122-B2 | Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives | ENEVATE CORPORATION (US) | 2024-06-18 | — | — | US | disclosed |
| US-20210218059-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2021-07-15 | — | — | US | disclosed |
| US-20210218059-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2021-07-15 | — | — | US | disclosed |
| US-10978739-B2 | Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives | ENEVATE CORPORATION (US) | 2021-04-13 | — | — | US | disclosed |
| EP-3346338-B1 | METHOD FOR STRIPPING RESIST FILM FROM METAL PLATE AND METHOD FOR MANUFACTURING ETCHED METAL PLATE | NIPPON STEEL NISSHIN CO LTD (JP) | 2020-05-06 | — | — | EP | disclosed |
| US-20190190070-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2019-06-20 | — | — | US | disclosed |
| WO-2019113528-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION (US) | 2019-06-13 | — | — | WO | disclosed |
| US-20110024392-A1 | INK-JET INK COMPOSITION FOR ETCHING RESIST | TOKYO PRINTING INK MFG. CO., LTD. (JP) | 2011-02-03 | — | — | US | disclosed |
| EP-0756208-B1 | Resin composition for electrophotographic toner, and toner comprising it | MITSUI CHEMICALS INC (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6011119-A | RESIN COMPOSITION SHOWS EXCELLENT CHARGING CHARACTERISTICS WITHOUT A CHARGE CONTROL AGENT; HIGH AND LOW MOLECULAR WEIGHT ADDITION POLYMERS AT LEAST ONE OF WHICH IS FROM AN UNSATURATED ANHYDRIDE AND AN ACRYLOYLOXYALKYL DICARBOXYLIC ACID ESTER | MITSUI CHEMICALS, INC. (JP) | 2000-01-04 | — | — | US | disclosed |
| EP-0756208-A1 | Resin composition for electrophotographic toner, and toner comprising it | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0353030-B1 | Photopolymerization initiator and photosensitive composition employing the same | CANON KK (JP) | 1995-03-15 | — | — | EP | disclosed |
| US-5124235-A | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1992-06-23 | — | — | US | disclosed |
| EP-0353030-A2 | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1990-01-31 | — | — | EP | disclosed |
| EP-0297583-A2 | Photosensitive material and image forming method by use thereof | CANON KABUSHIKI KAISHA (JP) | 1989-01-04 | — | — | EP | disclosed |