SCHEMBL14005686

SCHEMBL14005686

CC(F)C(C)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL250468 0.74
SCHEMBL11938106 0.74
SCHEMBL18341554 0.72
SCHEMBL727656 0.72
SCHEMBL14890206 0.72
SCHEMBL12885916 0.69 ALDH1A1 (0.32)
SCHEMBL8635746 0.69 ALDH1A1 (0.30)
SCHEMBL21026504 0.69
SCHEMBL16687581 0.69
SCHEMBL19986906 0.69 PDE2A (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2974526-B1 STACK INCLUDING HEATER LAYER AND DRAIN LAYER PPG IND OHIO INC (US) 2020-05-27 EP disclosed
US-20140353602-A1 DISPLAY PANEL AND A METHOD OF MANUFACTURING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-12-04 US disclosed
US-7455952-B2 Patterning process and resist overcoat material SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-11-25 US disclosed
US-20070122736-A1 RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. 2007-05-31 US disclosed