SCHEMBL14008508

SCHEMBL14008508

COCc1ccc(O)c2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.60
NPC1 O15118 2/20 0.60
ALOX12 P18054 1/20 0.60
HTT P42858 1/20 0.60
RAB9A P51151 1/20 0.60
NPSR1 Q6W5P4 1/20 0.60
IDO1 P14902 10/20 0.52
GCGR P47871 1/20 0.44
EP300 Q09472 2/20 0.42
KAT2B Q92831 2/20 0.42
KAT8 Q9H7Z6 2/20 0.42
HDAC3 O15379 1/20 0.42
NCOR2 Q9Y618 1/20 0.42
PRKCE Q02156 2/20 0.41
MYLK Q15746 2/20 0.41
MEN1 O00255 1/20 0.41
ALDH1A1 P00352 1/20 0.41
PRKCG P05129 1/20 0.41
MAPT P10636 1/20 0.41
PRKCA P17252 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11314967 0.87 KDM4E (0.52) KDM4ENPC1ALOX12HTTRAB9A
SCHEMBL11307318 0.78 KDM4E (0.47) KDM4ENPC1ALOX12HTTRAB9A
SCHEMBL21768730 0.78 CYP1A2 (0.54) KDM4ENPC1ALOX12HTTRAB9A
SCHEMBL3955098 0.77 IDO1 (0.59) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL29357437 0.76 IDO1 (0.65) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL1397170 0.76 IDO1 (0.65) IDO1EP300KAT2BKAT8HDAC3
SCHEMBL4612497 0.76 IDO1 (0.65) KDM4ENPC1ALOX12HTTRAB9A
SCHEMBL3083687 0.76 IDO1 (0.46) KDM4ENPC1ALOX12HTTRAB9A
SCHEMBL7984734 0.75 KDM4E (0.54) KDM4ENPC1ALOX12HTTRAB9A
SCHEMBL4468901 0.75 KDM4E (1.00) KDM4ENPC1ALOX12HTTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170168395-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-15 US disclosed
US-20170168395-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-15 US disclosed
US-7455948-B2 Photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2008-11-25 US disclosed
US-7455948-B2 Photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2008-11-25 US disclosed