SCHEMBL14009341

SCHEMBL14009341

O=C(OCc1cccc2ccc3ccccc3c12)C(F)(F)SOO

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.45
MEN1 O00255 4/20 0.36
KMT2A Q03164 4/20 0.36
PARP10 Q53GL7 1/20 0.36
EPHX1 P07099 1/20 0.36
SLC1A3 P43003 1/20 0.36
SLC1A2 P43004 1/20 0.36
SLC1A1 P43005 1/20 0.36
TDP1 Q9NUW8 1/20 0.35
CYP1A2 P05177 2/20 0.35
ATM Q13315 1/20 0.34
CYP2C19 P33261 2/20 0.34
LMNA P02545 1/20 0.34
CYP3A4 P08684 1/20 0.34
RECQL P46063 1/20 0.34
TRPV1 Q8NER1 1/20 0.34
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 1/20 0.33
GAA P10253 1/20 0.33
HPGD P15428 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2603116 0.91 PPARG (0.43) PPARGMEN1KMT2APARP10EPHX1
SCHEMBL14009416 0.90 MEN1 (0.45) MEN1KMT2APARP10EPHX1SLC1A3
SCHEMBL12128719 0.82 PPARG (0.49) PPARGMEN1KMT2APARP10EPHX1
SCHEMBL14009413 0.81 KDM4E (0.38) PPARGMEN1KMT2APARP10EPHX1
SCHEMBL2603107 0.80 MEN1 (0.43) MEN1KMT2APARP10EPHX1SLC1A3
SCHEMBL14009466 0.80 TRPV1 (0.42) MEN1KMT2APARP10TDP1CYP1A2
SCHEMBL14009369 0.80 ALDH1A1 (0.35) MEN1KMT2AEPHX1TDP1CYP1A2
SCHEMBL14009412 0.79 CYP1A2 (0.42) KMT2ATDP1CYP1A2ATMCYP2C19
SCHEMBL2606018 0.79 PPARG (0.46) PPARGMEN1KMT2APARP10EPHX1
SCHEMBL14035727 0.78 PPARG (0.45) PPARGMEN1KMT2APARP10EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed