SCHEMBL14009409

SCHEMBL14009409

O=C(OCCOc1cccc2ccccc12)C(F)(F)SOO

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
HPGD P15428 4/20 0.46
KDM4E B2RXH2 3/20 0.46
TDP1 Q9NUW8 2/20 0.46
HTR1B P28222 6/20 0.44
KCNA3 P22001 1/20 0.43
MCL1 Q07820 5/20 0.42
BCL2 P10415 3/20 0.42
BCL2L1 Q07817 2/20 0.42
BAD Q92934 2/20 0.42
ALB P02768 1/20 0.42
HTR1D P28221 2/20 0.42
OGG1 O15527 1/20 0.42
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
POLB P06746 1/20 0.41
MAPT P10636 1/20 0.41
RAB9A P51151 1/20 0.41
KMT2A Q03164 1/20 0.41
ATM Q13315 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2603110 0.91 ALDH1A1 (0.45) ALDH1A1HPGDKDM4ETDP1HTR1B
SCHEMBL14009479 0.86 IDO1 (0.40) ALDH1A1HPGDKDM4EMEN1POLB
SCHEMBL14009466 0.84 TRPV1 (0.42) ALDH1A1HPGDKDM4ETDP1MCL1
SCHEMBL13840940 0.82 ALDH1A1 (0.43) ALDH1A1HPGDKDM4ETDP1HTR1B
SCHEMBL13840927 0.82 ALDH1A1 (0.43) ALDH1A1HPGDKDM4ETDP1HTR1B
SCHEMBL12128704 0.82 KDM4E (0.53) ALDH1A1HPGDKDM4ETDP1HTR1B
SCHEMBL14009415 0.81 HSD17B10 (0.48) ALDH1A1HPGDKDM4ETDP1OGG1
SCHEMBL13840879 0.80 KDM4E (0.46) ALDH1A1HPGDKDM4ETDP1HTR1B
SCHEMBL2605920 0.79 KDM4E (0.47) ALDH1A1HPGDKDM4ETDP1HTR1B
SCHEMBL14009406 0.79 PPARG (0.48) ALDH1A1KDM4ETDP1MCL1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed