⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL65589 | 0.82 | — | — | |
| SCHEMBL930936 | 0.82 | — | — | |
| SCHEMBL33275 | 0.82 | — | — | |
| SCHEMBL3467470 | 0.82 | — | — | |
| SCHEMBL1796527 | 0.67 | — | — | |
| SCHEMBL19056832 | 0.67 | — | — | |
| SCHEMBL14958359 | 0.67 | — | — | |
| SCHEMBL16874147 | 0.67 | — | — | |
| SCHEMBL2539870 | 0.67 | — | — | |
| SCHEMBL1478768 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7045071-B2 | Method for fabricating ferroelectric random access memory device | HYNIX SEMICONDUCTOR INC. (KR) | 2006-05-16 | — | — | US | claimed |
| US-20040129670-A1 | Method for fabricating ferroelectric random access memory device | HYNIX SEMICONDUCTOR INC. (KR) | 2004-07-08 | — | — | US | claimed |
| CN-118139832-A | Cubic boron nitride sintered body | 住友电气工业株式会社 | 2024-06-04 | — | — | CN | disclosed |
| US-20240174576-A1 | CUBIC BORON NITRIDE SINTERED MATERIAL | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| EP-4079703-B1 | CUBIC BORON NITRIDE SINTERED MATERIAL | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2024-05-01 | — | — | EP | disclosed |
| EP-4079705-B1 | CUBIC BORON NITRIDE SINTERED MATERIAL | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-117957208-A | Cubic boron nitride sintered body | 住友电工硬质合金株式会社 | 2024-04-30 | — | — | CN | disclosed |
| US-11958782-B2 | Cubic boron nitride sintered material | SUMITOMO ELECTRIC HARDMETAL CORP. (JP) | 2024-04-16 | — | — | US | disclosed |
| WO-2024034076-A1 | SUPERABRASIVE GRAIN AND GRINDSTONE | 住友電気工業株式会社 | 2024-02-15 | — | — | WO | disclosed |
| CN-117305689-A | Martensitic heat-resistant steel for temperature of 630 ℃ or higher and preparation method thereof | 天津重型装备工程研究有限公司 | 2023-12-29 | — | — | CN | disclosed |
| EP-4079706-B1 | CUBIC BORON NITRIDE SINTERED MATERIAL | SUMITOMO ELECTRIC HARDMETAL CORP (JP) | 2023-12-27 | — | — | EP | disclosed |
| US-10029948-B2 | Sintered material, tool including sintered material, and sintered material production method | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2018-07-24 | — | — | US | disclosed |
| US-20170253531-A1 | SINTERED MATERIAL, TOOL INCLUDING SINTERED MATERIAL, AND SINTERED MATERIAL PRODUCTION METHOD | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| EP-3187476-A1 | SINTERED BODY, TOOL USING SINTERED BODY, AND SINTERED BODY PRODUCTION METHOD | Sumitomo Electric Industries, Ltd. (JP) | 2017-07-05 | — | — | EP | disclosed |
| EP-1321820-B1 | HALFTONE PHASE SHIFT PHOTOMASK AND BLANK FOR HALFTONE PHASE SHIFT PHOTOMASK | DAINIPPON PRINTING CO LTD (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-7045071-B2 | Method for fabricating ferroelectric random access memory device | HYNIX SEMICONDUCTOR INC. (KR) | 2006-05-16 | — | — | US | disclosed |
| US-6869736-B2 | Halftone phase shift photomask and blank for halftone phase shift photomask | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-20040129670-A1 | Method for fabricating ferroelectric random access memory device | HYNIX SEMICONDUCTOR INC. (KR) | 2004-07-08 | — | — | US | disclosed |
| US-20030186135-A1 | Halftone phase shift photomask and blank for halftone phase shift photomask | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-10-02 | — | — | US | disclosed |
| EP-1321820-A1 | HALFTONE PHASE SHIFT PHOTOMASK AND BLANK FOR HALFTONE PHASE SHIFT PHOTOMASK | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-06-25 | — | — | EP | disclosed |