Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TOP2A | P11388 | 3/20 | 0.77 |
| ▸ | TOP2B | Q02880 | 3/20 | 0.77 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9207860 | 0.91 | TOP2A (0.66) | TOP2ATOP2BMEN1KMT2ACYP1A2 | |
| Hydrochloric Acid SCHEMBL7734290 | 0.86 | TOP2A (0.97) | TOP2ATOP2BMEN1KMT2ACYP1A2 | |
| SCHEMBL16869399 | 0.81 | TOP2A (0.54) | TOP2ATOP2BCA1CA2CA4 | |
| SCHEMBL28088763 | 0.79 | TOP2A (0.52) | TOP2ATOP2BCYP1A2CYP2D6 | |
| SCHEMBL19452997 | 0.77 | TOP2A (0.51) | TOP2ATOP2BKMT2A | |
| SCHEMBL14029060 | 0.76 | TOP2A (0.77) | TOP2ATOP2B | |
| SCHEMBL10365364 | 0.73 | TOP2A (0.47) | TOP2ATOP2BMEN1KMT2ACYP1A2 | |
| SCHEMBL28088766 | 0.73 | TOP2A (0.47) | TOP2ATOP2BMEN1KMT2ACYP1A2 | |
| SCHEMBL11192478 | 0.72 | TOP2A (0.46) | TOP2ATOP2B | |
| SCHEMBL7581296 | 0.71 | TOP2A (0.45) | TOP2ATOP2BMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439011-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20070003887-A1 | Photothermographic material | RIKIO INOUE | 2007-01-04 | — | — | US | disclosed |