SCHEMBL14048416

SCHEMBL14048416

C[S+]([O-])C(F)(F)C(F)(F)C(F)(F)S(N)(=O)=O

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA13 Q8N1Q1 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4289615 0.72 CA2 (0.56) CA1CA2CA7CA13
SCHEMBL867460 0.72 CA2 (0.56) CA1CA2CA7CA13
SCHEMBL21073878 0.72
SCHEMBL14049637 0.71 CA1 (0.33) CA1CA2
SCHEMBL3432336 0.70 CA2 (0.53) CA1CA2CA7CA13
SCHEMBL5135851 0.70 CA2 (0.53) CA1CA2CA7CA13
SCHEMBL4463838 0.70 CA2 (0.53) CA1CA2CA7CA13
Lithium SCHEMBL30726243 0.70 CA2 (0.53) CA1CA2CA7CA13
SCHEMBL13684271 0.70 CA2 (0.53) CA1CA2CA7CA13
SCHEMBL5134956 0.70 CA2 (0.53) CA1CA2CA7CA13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1975716-A2 Positive resist composition and pattern forming method Fujifilm Corporation (JP) 2008-10-01 EP disclosed