⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL46066 | 1.00 | — | — | |
| SCHEMBL13135723 | 0.85 | ALDH1A1 (0.30) | — | |
| SCHEMBL10035498 | 0.84 | — | — | |
| SCHEMBL13953342 | 0.80 | — | — | |
| SCHEMBL12555178 | 0.79 | — | — | |
| SCHEMBL23374146 | 0.78 | — | — | |
| SCHEMBL24805977 | 0.78 | — | — | |
| SCHEMBL21567746 | 0.78 | — | — | |
| SCHEMBL24760032 | 0.78 | — | — | |
| SCHEMBL22905172 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1975716-A2 | Positive resist composition and pattern forming method | Fujifilm Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |